Optimized phase shift design migration

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

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716 21, 430 4, 430 5, 430 8, G06F 760, G06F 1710, G03F 900, G03F 500

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active

060832754

ABSTRACT:
A method for converting an integrated circuit design to a phase-shift complaint mask design. The method comprises the steps of locating features of the integrated circuit that violate predetermined design criteria converting error flags to physical marker shapes, modifying the located features using layout modification system technology based on a predetermined cost constraint, determining if all violations are corrected, and either changing the cost constraint to a higher cost constraint if violations still exist and repeating the process or terminating the conversion if all violations are corrected.

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