Optimized mirror design for optical direct write

Details Optimized mirror design for optical direct write Optimized mirror design for optical direct write

2007-09-18

2007-09-18

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S311000, C355S067000

Reexamination Certificate

active

10825342

ABSTRACT:
The present invention provides an optimized direct write lithography system using optical mirrors. That is, a maskless lithography system is provided. The maskless direct-write lithography system provided uses an array of mirrors configured to operate in a tilting mode, a piston-displacement mode, or both in combination. The controlled mirror array is used as a substitute for the traditional chrome on glass masks. In order to avoid constraining the system to forming edges of patterns aligned with the array of mirrors, gray-scale techniques are used for subpixel feature placement. The direct-writing of a pattern portion may rely on a single mirror mode or a combination of modes.

REFERENCES:
patent: 5015080 (1991-05-01), Cassarly et al.
patent: 2005/0068510 (2005-03-01), Bleeker et al.
patent: 2006/0077506 (2006-04-01), Sandstrom
Shroff et al., “Optical Analysis of Mirror Based Pattern Generation”, Emerging Lithographic Technologies VII, pp. 550-559. © 2003.

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