Optimized ECR plasma apparatus with varied microwave window thic

Details Optimized ECR plasma apparatus with varied microwave window thic Optimized ECR plasma apparatus with varied microwave window thic

1994-11-15

1995-11-14

Pascal, Robert J.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

118723MW, 31511121, H01J 724

Patent

active

054669910

ABSTRACT:
The present invention describes a technique to control the radial profile of microwave power in an ECR plasma discharge. In order to provide for a uniform plasma density to a specimen, uniform energy absorption by the plasma is desired. By controlling the radial profile of the microwave power transmitted through the microwave window of a reactor, the profile of the transmitted energy to the plasma can be controlled in order to have uniform energy absorption by the plasma. An advantage of controlling the profile using the window transmission characteristics is that variations to the radial profile of microwave power can be made without changing the microwave coupler or reactor design.

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