Optimization of sample plan for overlay

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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Details

C716S030000, C716S030000, C716S030000, C703S014000

Reexamination Certificate

active

10956608

ABSTRACT:
The present invention describes a method including: determining field-clustering scheme; selecting initial sample plan; establishing initial model of overlay, the initial model of overlay comprising components; and establishing efficient model of overlay from the initial model of overlay including: constructing matrices; identifying redundant components and eliminating the redundant components; and identifying highly-correlated components and determining whether to eliminate the highly-correlated components.

REFERENCES:
patent: 2004/0022444 (2004-02-01), Rhoads
patent: 2004/0162687 (2004-08-01), Smith et al.

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