Optical waveguide device fabricating method

Details Optical waveguide device fabricating method Optical waveguide device fabricating method

1998-03-12

2000-03-14

Angebranndt, Martin

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430 5, G02B 612

Patent

active

060371056

ABSTRACT:
An optical waveguide device fabricating method which requires that a lower clad layer is formed on the surface of a glass substrate, a metal layer is formed on the lower clad layer, and a metal pattern is formed by selectively etching the metal layer, for forming a waveguide core therein. Then, an optical polymer layer is formed in the metal pattern, the optical polymer layer in a metal-free portion of the metal pattern is cured by irradiating UV light onto the lower surface of the substrate, and the waveguide core is formed by removing the other portion of optical polymer layer except for the cured portion thereof and the metal layer. Finally, an upper clad layer is formed on the lower clad layer and the waveguide core.

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