Optical reticle inspection system and method

Details Optical reticle inspection system and method Optical reticle inspection system and method

1991-07-15

1992-11-17

Evans, F. L.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

G01B 1100

Patent

active

051647940

ABSTRACT:
An optical reticle inspection system and method employing a photolithographic projection optical system. The present invention provides for imaging a reticle pattern to be inspected onto a complementary reticle pattern and directly viewing the obscured image pattern to provide a measure of the fidelity of the reticle patterns.

REFERENCES:
patent: 3817626 (1974-06-01), Lietar
patent: 3873212 (1975-03-01), Shell
patent: 4964705 (1990-10-01), Markle

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