Coating apparatus – Gas or vapor deposition
Patent
1994-02-02
1996-08-27
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
118725, 118728, 118723E, 118663, 118666, 118712, 118713, 2503381, 374120, 374121, 374127, C23C 1600
Patent
active
055497560
ABSTRACT:
A temperature measurement system for use in a thin film deposition system is based on optical pyrometry on the backside of the deposition substrate. The backside of the deposition substrate is viewed through a channel formed in the susceptor of the deposition system. Radiation from the backside of the deposition substrate passes through an infrared window and to an infrared detector. The signal output by the infrared detector is coupled to electronics for calculating the temperature of the deposition substrate in accordance with blackbody radiation equations. A tube-like lightguide shields the infrared detector from background radiation produced by the heated susceptor.
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Japio Abstract Japan Pat. No. 3-156327, Fujitsu Ltd.
Blonigan Wendell T.
Sorensen Carl A.
Applied Materials Inc.
Breneman R. Bruce
Lund Jeffrie R.
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