Etching a substrate: processes – Forming or treating optical article
Reexamination Certificate
2006-08-08
2006-08-08
Vinh, Lan (Department: 1765)
Etching a substrate: processes
Forming or treating optical article
C216S025000, C216S039000
Reexamination Certificate
active
07087179
ABSTRACT:
In one aspect, the invention provides methods and apparatus for forming optical devices on large area substrates. The large area substrates are preferably made of quartz, silica or fused silica. The large area substrates enable larger optical devices to be formed on a single die. In another aspect, the invention provides methods and apparatus for forming integrated optical devices on large area substrates, such as quartz, silica or fused silica substrates. In another aspect, the invention provides methods and apparatus for forming optical devices using damascene techniques on large area substrates or silicon substrates. In another aspect, methods for forming optical devices by bonding an upper cladding layer on a lower cladding and a core is provided.
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Communication pursuant to Article 96(2) EPC dated Oct. 6, 2004; Application No. 01 990 046.3.
Law Kam S.
Mak Cecilia Y.
Maydan Dan
White John M.
Applied Materials Inc.
Moser Patterson & Sheridan LLP
Tran Binh X.
Vinh Lan
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