Optical film thickness measurement method, film formation method

Details Optical film thickness measurement method, film formation method Optical film thickness measurement method, film formation method

1996-07-12

1998-03-03

Evans, F. L.

Optics: measuring and testing

By configuration comparison

With photosensitive film or plate

25055928, G01B 1106

Patent

active

057241457

ABSTRACT:
An optical film thickness measurement method and film formation method uses a method of measuring the optical thickness of films by radiating a monitor light beam towards a substrate during the formation of a stack of films on the substrate and measuring the optical film thickness from extreme values in the resultant reflection intensity. This stack of films comprises a first film having a reflectance of at least 98% within a predetermined wavelength range and a second film formed on the first film and having an absorption coefficient of 1000 cm.sup.-1 or less within that predetermined wavelength range. The first film is measured by a first monitor light beam having a predetermined wavelength and the second film is measured by a second monitor light beam having a wavelength that differs from the predetermined wavelength range.

REFERENCES:
patent: 5410411 (1995-04-01), Uchida et al.
K. Bacher et al., "Molecular beam epitaxy growth of vertical cavity optical devices with in situ corrections," Jul. 21, 1992, pp. 1387-1389.

Affiliated with

Also associated with

Rating

Optical film thickness measurement method, film formation method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optical film thickness measurement method, film formation method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical film thickness measurement method, film formation method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2253518