Optical control interface between controller and process...

Details Optical control interface between controller and process... Optical control interface between controller and process...

2007-05-15

2007-05-15

Norton, Nadine (Department: 1765)

Etching a substrate: processes

Gas phase etching of substrate

With measuring, testing, or inspecting

C216S061000, C216S059000, C216S079000, C216S085000, C438S710000, C438S740000, C356S226000, C356S216000, C356S302000, C356S450000, C356S225000, C356S139100

Reexamination Certificate

active

10898891

ABSTRACT:
The present invention relates to interfacing new sensors to incumbent controls. In particular, it relates to optically interfacing a new sensor, such as a spectrometer with plasma generator, to an incumbent electro-optical sensor. Logic and resources to control activation of the incumbent electro-optical sensor may be included. Particular aspects of the present invention are described in the claims, specification and drawings.

REFERENCES:
patent: 6366346 (2002-04-01), Nowak et al.
S.Wolf, Silicon Processing for the VLSI Era, vol. 1, Lattice Press (1986), p. 567.

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