One time programming memory cell using MOS device

Static information storage and retrieval – Floating gate – Particular connection

Reexamination Certificate

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C365S185040, C365S185140, C365S185260, C365S185180

Reexamination Certificate

active

11272657

ABSTRACT:
An electroless plating apparatus is provided. The electroless plating apparatus includes a wafer holder; a chemical dispensing nozzle over the wafer holder; a conduit connected to the chemical dispensing nozzle; and a radiation source over the wafer holder.

REFERENCES:
patent: 5155701 (1992-10-01), Komori et al.
patent: 6956258 (2005-10-01), Peng
Suehle, J. S., et al., “Ultrathin Gate Oxide Reliability: Physical Models, Statistics, and Characterization,” IEEE Transactions on Electron Devices, vo. 49, No. 6, Jun. 2002, pp. 958-971.
Carter, J. R., et al., “Circuit-Level Modeling for Concurrent Testing of Operational Defects due to Gate Oxide Breakdown,” appears in the Proceedings of the 2005 Design, Automation, and Test in Europe (DATE), Munich, Germany, Mar. 7-11, 2005, http://www.ee.duke.edu/˜sorin/papers/date05—model.pdf.

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