Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent
2000-01-26
2000-11-07
Smith, Matthew
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
438154, 438275, 438197, 438232, 257357, 257500, 257546, 257342, H01L 218238
Patent
active
061435945
ABSTRACT:
In a split gate process for dual voltage chips, the N-type high-voltage transistors which are part of the ESD protection circuit, and therefore have the thicker gate oxide of the high-voltage transistors, can receive channel doping and drain extender doping which is the same as the core transistors. This causes these transistors to develop a high substrate current during an ESD event, triggering the protection circuit.
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Amerasekera E. Ajith
Baldwin Gregory C.
Gupta Vikas I.
Rost Timothy A.
Spratt David B.
Brady III W. James
Garner Jacqueline J.
Keshavan Belur V.
Smith Matthew
Telecky Jr. Frederick J.
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