O-quinonediazide sulfonic acid esters of phenolic compounds and

Details O-quinonediazide sulfonic acid esters of phenolic compounds and O-quinonediazide sulfonic acid esters of phenolic compounds and

1995-05-26

1996-08-20

Chu, John S. Y.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430165, 430191, 430192, 430193, 430330, G03F 730, G03F 7023

Patent

active

055478140

ABSTRACT:
A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formulae (IB) and (IIB): ##STR1## wherein the photosensitive compound is used in a radiation sensitive composition and a process for forming a positive patterned image.

REFERENCES:
patent: 5173389 (1992-12-01), Uenishi et al.
patent: 5294521 (1994-03-01), Jacovich et al.
patent: 5407779 (1995-04-01), Uetani et al.

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