Nonvolatile semiconductor memory device with improved gate...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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Details

C438S142000, C438S197000, C438S257000, C257SE21689

Reexamination Certificate

active

07132330

ABSTRACT:
In a nonvolatile semiconductor memory device, an interpoly dielectric film composed of a nitrogen-introduced CVD SiO2film is used as the gate oxide films of MOS transistors in a low voltage region of a peripheral circuit region. Gate oxide films of MOS transistors in a high voltage region of the peripheral circuit region are composed of a laminate of the SiO2film and a nitrogen-introduced CVD SiO2film. This arrangement improves transistor characteristics and reliability of gate oxide films of the peripheral circuit MOS transistors. It is also possible to realize miniaturization and low voltage operation. Further, simplification of the production process is made possible.

REFERENCES:
patent: 6143608 (2000-11-01), He et al.
patent: 6259133 (2001-07-01), Gardner et al.
patent: 6319780 (2001-11-01), Crivelli et al.
patent: 6327182 (2001-12-01), Shum et al.
patent: 6396108 (2002-05-01), Krivokapic et al.
patent: 6410387 (2002-06-01), Cappelletti et al.
patent: A 10-242310 (1998-09-01), None

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