Nonvolatile semiconductor memory and manufacturing method...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C257SE21179

Reexamination Certificate

active

11100492

ABSTRACT:
A nonvolatile semiconductor memory includes a trench isolation provided in a semiconductor substrate and an interlayer insulator provided on the semiconductor substrate. The trench isolation defines an active area extending in a first direction at the semiconductor substrate. The interlayer insulator has a wiring trench extending in a second direction intersecting the first direction. A first conductive material layer is provided at the cross-point of the active area and the wiring trench so that it is insulated from the active area. A second conductive material layer is provided in the wiring trench so that it is insulated from the first conductive material layer. A metal layer is provided in the wiring trench so that it is electrically in contact the second conductive material layer.

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S. Aritome, et al., “A 0.67um2Self-Alligned Shallow Trench Isolation Cell(SA-STI Cell) for 3V-Only 256Mbit NAND EEPROMs”, IEDM, 1994, pp. 61-64.

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