Nonvolatile memory devices and methods of forming the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions...

Reexamination Certificate

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Details

C257S500000, C257S501000, C257S502000, C257S503000, C257S903000, C257SE27064, C257SE21658, C257SE21620

Reexamination Certificate

active

07572684

ABSTRACT:
Nonvolatile memory devices, and methods of forming the same are disclosed. A memory device includes a substrate having a cell region, a low voltage region and a high voltage region. A ground selection transistor, a string selection transistor and a cell transistor are in the cell region, a low voltage transistor is in the low voltage region, and a high voltage transistor is in the high voltage region. A common source contact is on the ground selection transistor and a low voltage contact is on the low voltage transistor. A bit line contact is on the string selection transistor, a high voltage contact is on the high voltage transistor, and a bit line is on the bit line contact. A first insulating layer is on the substrate, and a second insulating layer is on the first insulating layer. The common source contact and the first low voltage contact extend to a height of the first insulating layer, and the bit line contact and the first high voltage contact extend to a height of the second insulating layer.

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