Nonvolatile ferroelectric memory device and driving method...

Static information storage and retrieval – Systems using particular element – Ferroelectric

Reexamination Certificate

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C365S063000, C365S210130, C365S230030

Reexamination Certificate

active

06721198

ABSTRACT:

This application claims the benefit of Korean Application No. P2001-71572 filed in Korea on Nov. 17, 2001, which is hereby incorporated by reference.
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a semiconductor memory device, and more particularly, to a nonvolatile memory device and a driving method thereof.
2. Discussion of the Related Art
Generally, a nonvolatile ferroelectric memory device, for example FRAM (Ferroelectric Random Access Memory), has a data processing speed similar to that of DRAM (Dynamic Random Access Memory), and also enables retention of stored data when power is off, thereby attracting public interest as a next generation memory device.
FRAM is a memory device having a structure similar to DRAM. However, unlike a DRAM memory cell, an FRAM memory cell uses ferroelectrics as a capacitor material to benefit from a high remanent polarization characteristic of ferroelectric materials. Due to the remanent polarization of the ferroelectric capacitor, data stored in an FRAM memory cell is not erased even if the electric field applied across the memory cell is removed.
FIG. 1
illustrates a graph of a hysteresis loop typical of ferroelectrics. Referring to
FIG. 1
, polarization induced by an electric field is not eliminated even if the electric field is removed, but maintains a predetermined quantity (d or a state) due to remanent polarization (or spontaneous polarization). A nonvolatile ferroelectric memory cell is a memory device using the d and a states of the ferroelectric capacitive material therein as digital logic value “1” and digital logic value “0”, respectively.
A nonvolatile ferroelectric memory device according to a related art is explained in the following by referring to the attached drawings.
FIG. 2
illustrates a diagram of a unit cell of a general ferroelectric memory. Referring to
FIG. 2
, a bit line B/L is disposed in one direction of the memory device; a word line W/L is disposed in a transversal direction with respect to the bit line B/L; a plate line P/L is disposed in the same direction as the word line W/L and at a predetermined distance therefrom; a transistor T
1
is disposed in such a manner that a gate and a source thereof are respectively connected to the word and bit lines, and a ferroelectric capacitor FC
1
is disposed in such a manner that the first and second terminals thereof are respectively connected to the drain of transistor T
1
and the plate line P/L of the memory device.
Data input/output operation of such a nonvolatile ferroelectric memory device is explained as follows.
FIG. 3A
illustrates a timing diagram for a plurality of signals at the input and output lines of a ferroelectric memory device during a write operation. The write operation is initiated by activating a chip enable signal CSBpad at an input of the memory cell using a high to low transition of an externally applied electrical signal, and simultaneously activating a write enable signal WEBpad with a high to low transition. Subsequently, during an address decoding stage of the write operation, a pulse applied to the word line of a cell is driven low to high to select that cell. To complete the write operation, a high or low signal is applied to the plate line corresponding to the selected memory cell for a predetermined time interval while the word line is asserted. Furthermore, a high or low signal synchronized with the write enable signal WEBpad is applied to the corresponding bit line depending on whether the input data to be written to the selected FRAM cell is digital logic value “1” or digital logic value “0”. Specifically, if the plate line is driven by a low signal while the word line is asserted and the bit line is high, then digital logic value “1” is recorded in the ferroelectric capacitor of the memory cell. If the plate line is driven by a high signal and the bit line is low, then digital logic value “0” is recorded in the ferroelectric capacitor.
FIG. 3B
illustrates a timing diagram for a plurality of signals at the input and output lines of a ferroelectric memory device during a read operation. The read operation for extracting stored data from the ferroelectric cell is explained as follows. When the chip enable signal CSBpad is asserted with a high to low voltage externally applied, all the bit lines are held at a low voltage by a driving signal before the corresponding word line is selected. After the bit lines have been deactivated, address decoding is performed. Then, the signal applied to the corresponding word line is raised from a low to a high level by an address decoder to select the targeted cell. A high level signal is applied to the plate line of the selected cell. Consequently, if digital logic value “1” was stored in the FRAM cell, the ferroelectric capacitor will be switched from the corresponding polarization state Qs to the opposite polarization state, thereby destroying the data stored in the memory cell. In contrast, if the data stored in the ferroelectric memory cell is digital logic value “0”, then the polarization state Qns of the capacitor is not switched by the signal applied to the plate line.
The variation of electric charge between the electrical dipoles in the ferroelectric material will differ depending on whether the polarization state of the cell is switched or not. Hence, the variation of the polarization state from a digital logic value “1” to digital logic value “0” can be detected using a sense amplifier. Specifically, when data stored in the memory cell is destroyed by a read operation, the polarization state changes from d to f according to the hysteresis loop in FIG.
1
. In contrast, when stored data is not destroyed by the read operation, the polarization state is changed from a to f. A sense amplifier is ordinarily used to differentiate between the two state transitions. When enabled for a specific time duration, the sense amplifier outputs digital logic value “1” if the data stored in the memory cell is erased. However, when the data is not erased, the resulting amplification keeps the output at digital logic value “0”. Hence, the original data can be restored using the output of the sense amplifier. Accordingly, the plate line is deactivated “high” to “low” while the high signal is applied to the corresponding word line.
In a schematic diagram of a nonvolatile ferroelectric memory device in
FIG. 4
according to the related art, a cell array unit has a folded bit line structure and one sense amplifier is shared by every two main bit lines in the cell array unit, and a middle reference array unit is formed between the cell array unit and an adjacent cell unit array (not shown in the drawing).
A detailed structure of the above-explained nonvolatile ferroelectric memory device is depicted in FIG.
5
. The memory device comprises a top section consisting of a first and second cell array units, and a bottom section consisting of a third and fourth array units. The top and bottom sections of the memory device are symmetrically disposed above and below a row of sense amplifiers, respectively. Moreover, an upper reference array unit is disposed between the first and second array units, and a lower reference array unit is disposed between the third and fourth array units.
Each of the cell array units has a folded bit line structure. The two bit lines in the top section shares a corresponding sense amplifier through a first control signal A, and the other two bit lines in the bottom section share the sense amplifier through a second control signal B.
Specifically, if a first bit line in the top section is used as a main bit line, a second adjacent bit line in the top section is used as a reference bit line. Moreover, if a first bit line in the bottom section is used as a main bit line, a second adjacent bit line in the bottom section is used as a reference bit line. Switching transistors are formed between the bit lines and the corresponding sense amplifiers to be controlled by the first and second control signals, respectively. Each of the sense amplifiers, as

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