Non-conductive alignment member for uniform plasma processing of

Details Non-conductive alignment member for uniform plasma processing of Non-conductive alignment member for uniform plasma processing of

1995-06-20

1997-05-06

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118728, 156345, C23C 1650

Patent

active

056266782

ABSTRACT:
A new susceptor design for used in plasma processing of substrates is provided. The susceptor is made of metal and serves as one of the electrodes in a parallel plate plasma reactor. The susceptor is flat and has no lip at its rim. A substrate having substantially the same diameter as the susceptor is placed on and covers the susceptor. This arrangement allows a uniform electric field to be formed across the whole surface of the substrate. As a result, the deposition on the surface of the substrate is uniform.

REFERENCES:
patent: 4767641 (1988-08-01), Kieser
patent: 5352294 (1994-10-01), White

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