Negative-working radiation-sensitive mixture and radiation-sensi

Details Negative-working radiation-sensitive mixture and radiation-sensi Negative-working radiation-sensitive mixture and radiation-sensi

1992-07-23

1995-03-28

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430325, 430330, 430923, G03C 1492

Patent

active

054016088

ABSTRACT:
A negative-working radiation-sensitive mixture containing

REFERENCES:
patent: 3692560 (1972-09-01), Rosenkranz et al.
patent: 4840867 (1989-06-01), Elsaesser et al.
patent: 5128231 (1992-07-01), Itoh et al.
F. M. Houlihan, et al., "An Evaluation of Nitrobenzyl Ester Chemistry for Chemical Amplification Resists", SPIE vol. 920, 1988, pp. 67-73.
J. V. Crivello, "Possibilities for Photoimaging Using Onium Salts", Polymer Engineering and Science, vol. 23, No. 17, Dec. 1983, pp. 953-956.
C. G. Willson, "Organic Resist Materials--Theory and Chemistry", Introduction to Microlithography ACS Symp. Ser. 219, 1983, pp. 88-159.

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