Negative resist composition and use thereof

Details Negative resist composition and use thereof Negative resist composition and use thereof

1997-12-02

1999-10-26

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

4302701, 430921, G03C 500

Patent

active

059725710

ABSTRACT:
Negative lithographic patterns are produced by imagewise exposing to electromagnetic radiation compositions comprising a polymer having pendant recurring ester groups or carbonate groups or both that contain a hetero atom; and a photoinitiator capable of releasing acid upon exposure to electromagnetic radiation. Specific polymersave poly(Hydroxy Alkyl) maleates.

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patent: 4904568 (1990-02-01), Kondo et al.
patent: 5068258 (1991-11-01), Noguchi
patent: 5204225 (1993-04-01), Feely
patent: 5506088 (1996-04-01), Nozaki et al.
patent: 5693452 (1997-12-01), Aoai et al.
Lamola, A.A, "Chemically Amplified Resists", Solid State Tech., Aug. 1991, pp. 53-60.
Aldrich chemical catalog, 1990-1991, p. 344.

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