Negative resist composition

Details Negative resist composition Negative resist composition

2006-08-29

2006-08-29

Hamilton, Cynthia (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

Reexamination Certificate

active

07097959

ABSTRACT:
A negative resist composition used in a liquid-crystal display element is disclosed. The negative resist composition according to the present invention includes a binder resin consisting of a copolymer including four predetermined monomers, a (meth)acryl monomer including at least 3 (meth)acryl groups, a (meth)acryl monomer including one or two (meth)acryl groups and a photo-initiator. The negative resist composition according to the present invention may be useful to significantly increase the manufacturing yield because it shows an extremely low brittleness during a bonding process or a hot process due to good physical properties such as film retention, pattern stability, adhesion to a substrate, and chemical resistance, as well as good flexibility upon formation of the pattern.

REFERENCES:
patent: 2003/0036018 (2003-02-01), Li
patent: 581536 (1994-02-01), None
patent: 10-0268697 (2000-07-01), None

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