Nanoparticle-based etching of silicon surfaces

Details Nanoparticle-based etching of silicon surfaces Nanoparticle-based etching of silicon surfaces

2008-03-21

2011-12-13

Vinh, Lan (Department: 1713)

Etching a substrate: processes

Nongaseous phase etching of substrate

Using film of etchant between a stationary surface and a...

C216S040000, C216S067000, C427S259000, C427S404000, C428S209000, C430S311000, C430S312000, C430S313000

Reexamination Certificate

active

08075792

ABSTRACT:
A method (300) of texturing silicon surfaces (116) such to reduce reflectivity of a silicon wafer (110) for use in solar cells. The method (300) includes filling (330, 340) a vessel (122) with a volume of an etching solution (124) so as to cover the silicon surface116) of a wafer or substrate (112). The etching solution (124) is made up of a catalytic nanomaterial (140) and an oxidant-etchant solution (146). The catalytic nanomaterial (140) may include gold or silver nanoparticles or noble metal nanoparticles, each of which may be a colloidal solution. The oxidant-etchant solution (146) includes an etching agent (142), such as hydrofluoric acid, and an oxidizing agent (144), such as hydrogen peroxide. Etching (350) is performed for a period of time including agitating or stirring the etching solution (124). The etch time may be selected such that the etched silicon surface (116) has a reflectivity of less than about 15 percent such as 1 to 10 percent in a 350 to 1000 nanometer wavelength range.

REFERENCES:
patent: 6329296 (2001-12-01), Ruby et al.
patent: 6538801 (2003-03-01), Jacobson et al.
patent: 6721083 (2004-04-01), Jacobson et al.
patent: 7090783 (2006-08-01), Cui et al.
patent: 2002/0145792 (2002-10-01), Jacobson et al.
patent: 2003/0096113 (2003-05-01), Jacobson et al.
patent: 2005/0056118 (2005-03-01), Xia et al.
patent: 2005/0271805 (2005-12-01), Kambe et al.
patent: 2006/0281333 (2006-12-01), Shin et al.
patent: 2006/0281334 (2006-12-01), Shin et al.
patent: 2007/0155021 (2007-07-01), Zhang et al.
patent: 2007/0155022 (2007-07-01), Yamakawa et al.
patent: 2007/0184576 (2007-08-01), Chang et al.
patent: 2007/0190326 (2007-08-01), Perry et al.
patent: 2007/0247620 (2007-10-01), Koo
patent: 2007/0281249 (2007-12-01), Tutt et al.
patent: 2009/0236317 (2009-09-01), Yost et al.
C.Chartier et al. Electrochimica Acta, vol. 53, (2008), pp. 5509-5516.
Koynov, S. et al, Black Nonreflecting Silicon Surfaces for Solar Cells, Applied Physics Letters 88, 203107 (2006).
Koynov, S. et al, Black Multi-Crystalline Silicon Solar Cells, Rapid Research Letters, Phys. Stat. Sol. 1, No. 2, R53-R55 (2007).

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