Nano-electrode-array for integrated circuit interconnects

Details Nano-electrode-array for integrated circuit interconnects Nano-electrode-array for integrated circuit interconnects

2007-06-05

2007-06-05

Clark, S. V. (Department: 2823)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C977S723000, C438S631000

Reexamination Certificate

active

10990273

ABSTRACT:
An integrated circuit and a method of manufacturing an integrated circuit is provided including providing an integrated circuit having a trench and via provided in a dielectric layer. A nano-electrode-array is formed over the dielectric layer in the trench and via, and a conductor is deposited over the nano-electrode-array. The conductor and the nano-electrode-array are coplanar with a surface of the dielectric layer.

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