Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-01-17
2009-10-13
Ho, Tu-Tu V (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S401000, C257S724000, C257S777000, C257SE27026
Reexamination Certificate
active
07602028
ABSTRACT:
A NAND flash memory device includes a lower semiconductor layer and an upper semiconductor layer located over the lower semiconductor layer, a first drain region and a first source region located in the lower semiconductor layer, and a second drain region and a second source region located in the upper semiconductor layer. A first gate structure is located on the lower semiconductor layer, and a second gate structure is located on the upper semiconductor layer. A bit line is located over the upper semiconductor layer, and at least one bit line plug is connected between the bit line and the first drain region, where the at least one bit line plug extends through a drain throughhole located in the upper semiconductor layer.
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Cho Won-Seok
Jang Jae-Hoon
Jang Young-Chul
Jung Soon-Moon
Rah Young-Seop
Ho Tu-Tu V
Samsung Electronics Co,. Ltd.
Volentine & Whitt PLLC
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