Multipurpose processing chamber for chemical vapor deposition pr

Details Multipurpose processing chamber for chemical vapor deposition pr Multipurpose processing chamber for chemical vapor deposition pr

1997-03-03

1999-01-05

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118725, 118728, 118729, 219451, 219465, 219466, 174151, 174 65R, 174 65SS, 174 88S, 439559, 439252, C23C 1600

Patent

active

058556753

ABSTRACT:
A processing station adaptable to standard cluster tools has a vertically-translatable pedestal having an upper wafer-support surface including a heater plate adapted to be plugged into a unique feedthrough in the pedestal. At a lower position for the pedestal wafers may be transferred to and from the processing station, and at an upper position for the pedestal the pedestal forms an annular pumping passage with a lower circular opening in a processing chamber. A removable, replaceable ring at the lower opening of the processing chamber allows process pumping speed to be tailored for different processes by replacing the ring. In some embodiments the pedestal also has a surrounding shroud defining an annular pumping passage around the pedestal. A unique two-zone heater plate is adapted to the top of the pedestal, and connects to a unique feedthrough allowing heater plates to be quickly and simply replaced. In some embodiments the top of the processing chamber is removable allowing users to remove either pedestals or heater assemblies. Or both, through the open top of a processing station.

REFERENCES:
patent: 5078851 (1992-01-01), Nishihata
patent: 5156820 (1992-10-01), Wong
patent: 5294778 (1994-03-01), Carman
patent: 5582866 (1996-12-01), White

Affiliated with

Also associated with

Rating

Multipurpose processing chamber for chemical vapor deposition pr does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multipurpose processing chamber for chemical vapor deposition pr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multipurpose processing chamber for chemical vapor deposition pr will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-858330