4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Carl J. Galewski

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Apparatus and concept for minimizing parasitic chemical...

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Apparatus and concept for minimizing parasitic chemical...

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Apparatus and concept for minimizing parasitic chemical...

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Multipurpose processing chamber for chemical vapor deposition pr

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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PECVD and CVD processes for WNx deposition

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1051861

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