Multiple frequency plasma processor method and apparatus

Details Multiple frequency plasma processor method and apparatus Multiple frequency plasma processor method and apparatus

2008-07-29

2008-07-29

Tran, Thuy Vinh (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111810, C156S345280, C118S7230AN

Reexamination Certificate

active

07405521

ABSTRACT:
A workpiece is processed with a plasma in a vacuum plasma processing chamber by exciting the plasma at several frequencies such that the excitation of the plasma by the several frequencies simultaneously causes several different phenomena to occur in the plasma. The chamber includes central top and bottom electrodes and a peripheral top and/or bottom electrode arrangement that is either powered by RF or is connected to a reference potential by a filter arrangement that passes at least one of the plasma excitation frequencies to the exclusion of other frequencies.

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