Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2011-03-29
2011-03-29
Duda, Kathleen (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S394000
Reexamination Certificate
active
07914975
ABSTRACT:
A method of patterning a semiconductor substrate includes creating a first set of patterned features in a first inorganic layer; creating a second set of patterned features in one of the first inorganic layer and a second inorganic layer; and transferring, into an organic underlayer, both the first and second sets of patterned features, wherein the first and second sets of patterned features are combined into a composite set of patterned features that are transferable into the substrate by using the organic underlayer as a mask.
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D.C. Owe-Yang et al.; “Double Exposure for the Contact Layer of the 65-nm Node;” Presented at SPIE Conference, San Jose, CA Mar. 1, 2005.
Burns Sean D.
Gabor Allen H.
Halle Scott D.
Pfeiffer Dirk
Cai Yuanmin
Cantor & Colburn LLP
Duda Kathleen
International Business Machines - Corporation
Sullivan Caleen O
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