Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1984-06-11
1985-08-13
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430286, 430330, 430374, 430396, 430502, 430503, 430512, G03F 702, G03C 176
Patent
active
045350531
ABSTRACT:
Spin castable polymethylmethacrylate photoresist compositions are provided utilizing certain cinnamic acid derivatives as dyes capable of absorbing light at about 436 nm and substantially transparent to light at about 220-250 nm. The spin castable polymethylmethacrylate resist compositions are used in making semiconductor devices by multilayer photoresist methods.
REFERENCES:
patent: 4362809 (1982-12-01), Chen et al.
patent: 4414314 (1983-11-01), Kaplan et al.
Bassous et al., "Acridine and Acridine Derivatives in Photoresist", IBM Tech. Dis. Bulletin, vol. 23(7B), Dec. 1980, p. 3387.
Chang et al., "An Ideal Projection Photolithography", 1981 Symposium on VLSI Technology, Digest of Technical Papers, Maui, HI., U.S.A., Sep. 1981.
Submicrometer Contact Hole Delineation with a Two-Layer Deep-UV Portable Conformable Masking System, Petrillo et al., J. Vac. Sci. Technol., B 1 (4), Oct.-Dec. 1983, pp. 1219-1224.
The Chemical Behavior of Positive Working Systems, Strieter, Eastman Kodak Co., Proc. of the Microelectronics Seminar Interface '76.
Practicing the Novolac Deep-UV Portable Conformable Masking Technique, Lin et al., J. Vac. Sci. Technol., 19(4), Nov./Dec. 1981, pp. 1313-1319.
Dec. 7, 1982, Official Gazette, p. 296.
Griffing Bruce F.
West Paul R.
Davis Jr. James C.
Dees Jos,e G.
General Electric Company
Kittle John E.
Magee Jr. James
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