Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1991-12-17
1993-11-09
RoDee, Christopher
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430271, 430325, 430326, 430313, G03F 736, G03C 558, G03C 193
Patent
active
052601722
ABSTRACT:
The present invention relates to an improved process for forming a multilayer resist image comprising a planarizing layer of poly(vinylbenzoic acid).
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Ito et al., "Positive/Negative mid UV Resists with High Thermal Stability", SPIE vol. 771, Advances in Resist Technology and Processing IV, (1987).
International Business Machines - Corporation
Martin Robert B.
Rodee Christopher
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