Multilayer e-beam lithography on nonconducting substrates

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging

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430 22, 430942, 2504923, G03F 720

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active

057337080

ABSTRACT:
A technique is described which provides for directly placing multiple patterns on a nonconducting substrate using an electron beam. Prior to patterning, a conductive coating is applied to the nonconductive substrate. The patterns are generated by controlling the position and the speed of movement of the electron beam. Each pattern contains fiducials lying outside of the pattern's active region. After a conductive layer has been exposed, the patterned regions are removed, typically through etching. A separate etch is used to etch the pattern into substrate. The unpatterned portions of the conductive coating are then removed and a new conductive coating is applied to the substrate, insuring that the fiducials are protected during the removal procedure so that they can be used to align subsequent patterns. This procedure is repeated as many times as necessary to form the desired number of patterns in the substrate. This procedure is directly applicable to the generation of computer-generated holograms, specifically diffractive optics. This technique can also be used to generate phase-shifted lithographic mask.

REFERENCES:
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patent: 4816361 (1989-03-01), Glendinning
patent: 4823012 (1989-04-01), Kosugi
patent: 4895790 (1990-01-01), Swanson et al.
patent: 4983864 (1991-01-01), Murai

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