Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1995-10-02
1998-03-31
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430 22, 430942, 2504923, G03F 720
Patent
active
057337080
ABSTRACT:
A technique is described which provides for directly placing multiple patterns on a nonconducting substrate using an electron beam. Prior to patterning, a conductive coating is applied to the nonconductive substrate. The patterns are generated by controlling the position and the speed of movement of the electron beam. Each pattern contains fiducials lying outside of the pattern's active region. After a conductive layer has been exposed, the patterned regions are removed, typically through etching. A separate etch is used to etch the pattern into substrate. The unpatterned portions of the conductive coating are then removed and a new conductive coating is applied to the substrate, insuring that the fiducials are protected during the removal procedure so that they can be used to align subsequent patterns. This procedure is repeated as many times as necessary to form the desired number of patterns in the substrate. This procedure is directly applicable to the generation of computer-generated holograms, specifically diffractive optics. This technique can also be used to generate phase-shifted lithographic mask.
REFERENCES:
patent: 4377627 (1983-03-01), Vinton
patent: 4816361 (1989-03-01), Glendinning
patent: 4823012 (1989-04-01), Kosugi
patent: 4895790 (1990-01-01), Swanson et al.
patent: 4983864 (1991-01-01), Murai
Catanzaro Brian
Smith Adlai H.
Duda Kathleen
Litel Instruments
LandOfFree
Multilayer e-beam lithography on nonconducting substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multilayer e-beam lithography on nonconducting substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multilayer e-beam lithography on nonconducting substrates will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-50533