Multi-zone gas flow control in a process chamber

Coating apparatus – Gas or vapor deposition – With treating means

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Details

118715, 118724, 118 501, 392416, 392418, 219390, 219405, 219411, 239450, 239555, 239558, 239589, 239596, C23C 1600, F27B 504, F27B 516

Patent

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060902108

ABSTRACT:
A showerhead for introducing gas from one or more external supplies into a substrate processing chamber, the showerhead including a faceplate including a plurality of gas injection ports through which gas is injected into the chamber, wherein the plurality of gas injection ports includes a first subset of gas injection ports and a second subset of gas injection ports; a first gas distribution system which during use delivers a first gas to the first subset of injection ports for injection into the chamber; and a second gas distribution system which during use delivers a second gas to the second subset of injection ports for injection into the chamber.

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Copy of European Search Report dated Nov. 11, 1997.

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