Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2007-03-06
2007-03-06
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192130, C204S298030, C204S298190, C204S298200
Reexamination Certificate
active
11029641
ABSTRACT:
A multi-track magnetron having a convolute shape and asymmetric about the target center about which it rotates. A plasma track is formed as a closed loop between opposed inner and outer magnetic poles, preferably as two or three radially arranged and spirally shaped counter-propagating tracks with respect to the target center and preferably passing over the rotation axis. The pole shape may be optimized to produce a cumulative track length distribution conforming to the function L=arn. After several iterations of computerized optimization, the pole shape may be tested for sputtering uniformity with different distributions of magnets in the fabricated pole pieces. If the uniformity remains unsatisfactory, the design iteration is repeated with a different n value, different number of tracks, or different pole widths. The optimization reduces azimuthal sidewall asymmetry and improves radial deposition uniformity.
REFERENCES:
patent: 4631106 (1986-12-01), Nakazato et al.
patent: 4995958 (1991-02-01), Anderson et al.
patent: 5242566 (1993-09-01), Parker
patent: 5314597 (1994-05-01), Harra
patent: 5320728 (1994-06-01), Tepman
patent: 6024843 (2000-02-01), Anderson et al.
patent: 0 874 065 (1998-04-01), None
Gung Tza-Jing
Guo Ted
Lei Jian-Xin
Yang Hong S.
Applied Materials Inc.
Guenzer Charles S.
McDonald Rodney G.
LandOfFree
Multi-track magnetron exhibiting more uniform deposition and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multi-track magnetron exhibiting more uniform deposition and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-track magnetron exhibiting more uniform deposition and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3769756