Multi-step system and method for curing a dielectric film

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C118S643000, C118S724000, C257SE21241, C438S795000

Reexamination Certificate

active

07622378

ABSTRACT:
A multi-step system and method for curing a dielectric film in which the system includes a drying system configured to reduce the amount of contaminants, such as moisture, in the dielectric film. The system further includes a curing system coupled to the drying system, and configured to treat the dielectric film with ultraviolet (UV) radiation and infrared (IR) radiation in order to cure the dielectric film.

REFERENCES:
patent: 5705232 (1998-01-01), Hwang et al.
patent: 6303524 (2001-10-01), Sharangpani et al.
patent: 6692903 (2004-02-01), Chen et al.
patent: 6756085 (2004-06-01), Waldfried et al.
patent: 6764718 (2004-07-01), Nakamura et al.
patent: 7030468 (2006-04-01), Gates et al.
patent: 7081638 (2006-07-01), Augur
patent: 7098149 (2006-08-01), Lukas et al.
patent: 7166531 (2007-01-01), Van Den Hoek et al.
patent: 7166963 (2007-01-01), Janos et al.
patent: 7223670 (2007-05-01), Callegari et al.
patent: 7282458 (2007-10-01), Gates et al.
patent: 7404990 (2008-07-01), Lukas et al.
patent: 2002/0092472 (2002-07-01), Hayashi et al.
patent: 2003/0054115 (2003-03-01), Albano et al.
patent: 2003/0224544 (2003-12-01), Prisco et al.
patent: 2004/0096593 (2004-05-01), Lukas et al.
patent: 2004/0096672 (2004-05-01), Lukas et al.
patent: 2004/0166628 (2004-08-01), Park et al.
patent: 2004/0175501 (2004-09-01), Lukas et al.
patent: 2005/0064726 (2005-03-01), Reid et al.
patent: 2005/0085094 (2005-04-01), Yoo
patent: 2005/0272220 (2005-12-01), Waldfried et al.
patent: 2006/0024976 (2006-02-01), Waldfried et al.
patent: 2006/0141806 (2006-06-01), Waldfried et al.
patent: 2006/0165904 (2006-07-01), Ohara
patent: 2006/0183345 (2006-08-01), Nguyen et al.
patent: 2006/0202311 (2006-09-01), Nguyen et al.
patent: 2006/0249078 (2006-11-01), Nowak et al.
patent: 2006/0251827 (2006-11-01), Nowak et al.
patent: 2006/0274405 (2006-12-01), Waldfried et al.
patent: 2007/0105401 (2007-05-01), Liu et al.
patent: 2007/0161230 (2007-07-01), Chen et al.
patent: 2007/0228289 (2007-10-01), Kaszuba et al.
patent: 2007/0228618 (2007-10-01), Kaszuba et al.
patent: 2007/0257205 (2007-11-01), Rocha-Alvarez et al.
patent: 2007/0264786 (2007-11-01), Chen et al.
patent: 2007/0284698 (2007-12-01), Callegari et al.
patent: 2007/0286963 (2007-12-01), Rocha-Alvarez et al.
patent: 2008/0063809 (2008-03-01), Lee et al.
Willi Volksen, et al., “Laser Spike Annealing: A Novel Post-Porosity Treatment for Significant Toughening of Low-k Organosilicates”, IEEE, 2006, pp. 146-148.
Thomas Abell, et al., “Solid state MAS NMR spectroscopic characterization of plasma damage and UV modification of low k dielectric films”, Mater. Res. Soc. Symp. Proc., vol. 863, Materials Research Society, 2005, pp. B1.8.1-B1.8.6.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Multi-step system and method for curing a dielectric film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multi-step system and method for curing a dielectric film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-step system and method for curing a dielectric film will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4069006

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.