Multi-step process for etching photomasks

Details Multi-step process for etching photomasks Multi-step process for etching photomasks

2005-10-31

2008-05-13

Young, Christopher G. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C430S313000, C430S316000, C430S318000, C430S319000, C430S323000, C216S067000

Reexamination Certificate

active

07371485

ABSTRACT:
Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a photolithographic reticle including positioning the reticle on a support member in a processing chamber, wherein the reticle comprises a metal photomask layer formed on a silicon-based substrate, and a patterned resist material deposited on the silicon-based substrate, etching the substrate with an oxygen-free processing gas, and then etching the substrate with an oxygen containing processing gas.

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