Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2005-05-26
2009-06-16
Smith, Matthew (Department: 2823)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S157000, C438S182000, C438S195000, C257S315000, C257SE21179, C257SE21422, C257SE21680
Reexamination Certificate
active
07547599
ABSTRACT:
Floating-gate memory cells having a split floating gate facilitate decreased sensitivity to localized defects in the tunnel dielectric layer and/or the intergate dielectric layer. Such memory cells also permit storage of more than one bit per cell. Methods of the various embodiments facilitate fabrication of floating gate segments having dimensions less than the capabilities of the lithographic processed used to form the gate stacks.
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Abatchev Mirzafer
Sandhu Gurtej S.
Kim Su C
Leffert Jay & Polglaze P.A.
Micro)n Technology, Inc.
Smith Matthew
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