Multi-state memory cell

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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Details

C438S157000, C438S182000, C438S195000, C257S315000, C257SE21179, C257SE21422, C257SE21680

Reexamination Certificate

active

07547599

ABSTRACT:
Floating-gate memory cells having a split floating gate facilitate decreased sensitivity to localized defects in the tunnel dielectric layer and/or the intergate dielectric layer. Such memory cells also permit storage of more than one bit per cell. Methods of the various embodiments facilitate fabrication of floating gate segments having dimensions less than the capabilities of the lithographic processed used to form the gate stacks.

REFERENCES:
patent: 5328810 (1994-07-01), Lowrey et al.
patent: 5650343 (1997-07-01), Luning et al.
patent: 5688704 (1997-11-01), Liu
patent: 5714412 (1998-02-01), Liang et al.
patent: 6344993 (2002-02-01), Harari et al.
patent: 6847068 (2005-01-01), Chuang et al.
patent: 6903405 (2005-06-01), Takahashi
patent: 6939767 (2005-09-01), Hoefler et al.
patent: 6995063 (2006-02-01), Park
patent: 2004/0087139 (2004-05-01), Yeh et al.
patent: 2005/0085090 (2005-04-01), Mui et al.
patent: 2005/0087892 (2005-04-01), Hsu et al.
patent: 2005/0153502 (2005-07-01), Kim et al.
patent: 2005/0180217 (2005-08-01), Ding
patent: 2005/0194627 (2005-09-01), Nomoto et al.
patent: 2005/0227434 (2005-10-01), Wu et al.

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