Multi mirror system for an illumination system

Details Multi mirror system for an illumination system Multi mirror system for an illumination system

2005-01-11

2005-01-11

Shafer, Ricky D. (Department: 2872)

Optical: systems and elements

Mirror

Plural mirrors or reflecting surfaces

C359S859000, C359S861000, C374S034000, C374S145000

Reexamination Certificate

active

06840640

ABSTRACT:
There is provided a multi-mirror system for an illumination system with wavelengths ≦193 nm. The multi-mirror system includes (a) an imaging system having a first mirror and a second mirror, (b) an object plane, (c) an image plane in which the imaging system forms an image of an object, and (d) an arc-shaped field in the image plane, where a radial direction in a middle of the arc-shaped field defines a scanning direction. The first and second mirrors are arranged such that an edge sharpness of the arc-shaped field is smaller than 5 mm in the scanning direction. Rays traveling from the object plane to the image plane impinge a used area of the first and second mirrors with incidence angles relative to a surface normal of the mirrors ≦30° or ≧60°.

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“Illumination Optics Design for EUV-Lithography”, M. Antoni et al, SPIE vol. 4146, p25-34 (Aug. 3, 2000).

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