Multi-layer spectral purity filter, lithographic apparatus...

Optical: systems and elements – Having significant infrared or ultraviolet property – Multilayer filter or multilayer reflector

Reexamination Certificate

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Details

C359S359000, C359S361000

Reexamination Certificate

active

11091923

ABSTRACT:
A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.

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patent: WO 2005/119365 (2005-12-01), None
Powell et al, “Filter windows for EUV lithography”, 5 pages; http://www.luxel.com.
RD 500051, “Resist Spectral Filter System for Extreme Ultraviolet Projection Lithography,” Research Disclosure, vol. 500, Dec. 10, 2005, p. 1432.

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