Optical: systems and elements – Having significant infrared or ultraviolet property – Multilayer filter or multilayer reflector
Reexamination Certificate
2008-05-13
2008-05-13
Nguyen, Thong Q (Department: 2872)
Optical: systems and elements
Having significant infrared or ultraviolet property
Multilayer filter or multilayer reflector
C359S359000, C359S361000
Reexamination Certificate
active
07372623
ABSTRACT:
A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.
REFERENCES:
patent: 5907436 (1999-05-01), Perry et al.
patent: 6014251 (2000-01-01), Rosenberg et al.
patent: 6392792 (2002-05-01), Naulleau
patent: 6522465 (2003-02-01), Goldstein
patent: 6906788 (2005-06-01), Bakker et al.
patent: 7154666 (2006-12-01), Wedowski
patent: 2004/0061930 (2004-04-01), Wedowski
patent: 2004/0105083 (2004-06-01), Kurt et al.
patent: 2005/0008818 (2005-01-01), Olszewski et al.
patent: 2005/0040345 (2005-02-01), Bakker et al.
patent: 2006/0160031 (2006-07-01), Wurm et al.
patent: 1 197 803 (2002-04-01), None
patent: 1 202 117 (2002-05-01), None
patent: 1 331 519 (2003-07-01), None
patent: WO 2005/119365 (2005-12-01), None
patent: WO 2005/119365 (2005-12-01), None
Powell et al, “Filter windows for EUV lithography”, 5 pages; http://www.luxel.com.
RD 500051, “Resist Spectral Filter System for Extreme Ultraviolet Projection Lithography,” Research Disclosure, vol. 500, Dec. 10, 2005, p. 1432.
Banine Vadim Yevgenyevich
Moors Johannes Hubertus Josephina
Salashchenko Nikolay
Shmaenok Leonid
ASML Netherlands B.V.
Nguyen Thong Q
Pillsbury Winthrop Shaw & Pittman LLP
LandOfFree
Multi-layer spectral purity filter, lithographic apparatus... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multi-layer spectral purity filter, lithographic apparatus..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-layer spectral purity filter, lithographic apparatus... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2766863