Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2005-10-18
2005-10-18
Wells, Nikita (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C118S620000, C250S442110, C414S217000, C414S422000
Reexamination Certificate
active
06956223
ABSTRACT:
Semiconductor processing apparatus is disclosed which provides for movement of a scanning arm60of a substrate or wafer holder180, in at least two generally orthogonal directions (so-called X-Y scanning). Scanning in a first direction is longitudinally through an aperture55in a vacuum chamber wall. The arm60is reciprocated by one or more linear motors90A,90B. The arm60is supported relative to a slide100using gimballed air bearings so as to provide cantilever support for the arm relative to the slide100. A compliant feedthrough130into the vacuum chamber for the arm60then acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faraday450is attached to the arm60adjacent the substrate holder180to allow beam profiling to be carried out both prior to and during implant. The Faraday450can instead or additionally be mounted adjacent the rear of the substrate holder or at 90° to it to allow beam profiling to be carried out prior to implant, with the substrate support reversed or horizontal and out of the beam line.
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Edwards Peter
Farley Marvin
Harrison Bernard
Murrell Adrian
Roberts Frank D.
Applied Materials Inc.
Hashmi Zia R.
Tennant Boult Wado
Wells Nikita
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