Multi-beam scanning projection exposure apparatus and method wit

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

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250548, 355 69, 356400, G01J 132

Patent

active

055810756

ABSTRACT:
An exposure apparatus comprises a plurality of illumination optical systems for generating a plurality of light beams, a plurality of projection optical systems disposed corresponding to the plurality of illumination optical systems, respectively, a plurality of light intensity detectors, provided respectively for the plurality of illumination optical systems, for detecting individual intensities of the plurality of light beams, a light intensity changing device for changing the respective intensities of the plurality of light beams, and a control device for controlling the light intensity changing device and uniformizing the intensities of the plurality of light beams to a substantially fixed level.

REFERENCES:
patent: 4713675 (1987-12-01), Yui
patent: 4947030 (1990-08-01), Takahashi
patent: 5097291 (1992-03-01), Suzuki
patent: 5250797 (1993-10-01), Sano et al.
patent: 5347118 (1994-09-01), Iwanaga
patent: 5420417 (1995-05-01), Shiraishi

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