MOSFET having recessed channel

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S332000, C257S369000, C257SE29260, C257SE29257, C438S270000, C438S574000, C438S589000, C438S596000

Reexamination Certificate

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07994572

ABSTRACT:
A MOSFET having a recessed channel and a method of fabricating the same. The critical dimension (CD) of a recessed trench defining the recessed channel in a semiconductor substrate is greater than the CD of the gate electrode disposed on the semiconductor substrate. As a result, the misalignment margin for a photolithographic process used to form the gate electrodes can be increased, and both overlap capacitance and gate induced drain leakage (GIDL) can be reduced.

REFERENCES:
patent: 5362665 (1994-11-01), Lu
patent: 5512517 (1996-04-01), Bryant
patent: 6251730 (2001-06-01), Luo
patent: 6482701 (2002-11-01), Ishikawa et al.
patent: 6509233 (2003-01-01), Chang et al.
patent: 6518616 (2003-02-01), Dyer et al.
patent: 6617213 (2003-09-01), Hummler
patent: 6740558 (2004-05-01), Hummler
patent: 6780732 (2004-08-01), Durcan et al.
patent: 2002/0196651 (2002-12-01), Weis
patent: 2006/0035434 (2006-02-01), Tabata et al.
patent: 2002-0060693 (2000-10-01), None
patent: 2001-0064328 (2001-07-01), None

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