Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2009-02-10
2010-11-09
Nhu, David (Department: 2895)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S510000, C438S514000, C257SE21170, C257SE21051, C257SE21058, C257SE21227, C257SE21247, C257SE21248, C257SE21421
Reexamination Certificate
active
07829402
ABSTRACT:
A MOSFET device and a method for fabricating MOSFET devices are disclosed. The method includes providing a semiconductor device structure including a semiconductor device layer of a first conductivity type, and ion implanting a well structure of a second conductivity type in the semiconductor device layer, where the ion implanting includes providing a dopant concentration profile in a single mask implant sequence.
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Asmita Saha and James A. Cooper; A 1-kV 4H-SiC Power DMOSFET Optimized for Low ON-Resistance; IEEE Transactions on Electron Devices; Oct. 2007; pp. 2786-2791; vol. 54, No. 10.
Arthur Stephen Daley
Losee Peter Almern
Matocha Kevin Sean
Rao Ramakrishna
Stum Zachary Matthew
Asmus Scott J.
General Electric Company
Nhu David
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