MOS transistor with a deformable gate

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Physical deformation

Reexamination Certificate

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Details

C257S254000, C257S416000, C257S417000, C257S418000, C257S419000, C257S420000, C257S522000, C257S599000, C257SE29324

Reexamination Certificate

active

11227624

ABSTRACT:
A MOS transistor with a deformable gate formed in a semiconductor substrate, including source and drain areas separated by a channel area extending in a first direction from the source to the drain and in a second direction perpendicular to the first one, a conductive gate beam placed at least above the channel area extending in the second direction between bearing points placed on the substrate on each side of the channel area, and such that the surface of the channel area is hollow and has a shape similar to that of the gate beam when said beam is in maximum deflection towards the channel area.

REFERENCES:
patent: 5818093 (1998-10-01), Gutteridge et al.
patent: 6211558 (2001-04-01), Ismail et al.
patent: 2827270 (2003-01-01), None
French Search Report from corresponding French Application No. 0452070, filed Sep. 15, 2004.
Pott, V. et al.,The Suspended-Gate MOSFET(SG-MOSFET):A Modeling Outlook for the Design of RF MES Switches and Tunable Capacitors, CAS 2003, International Semiconductor Conference, Oct. 9-13, 2001, Sinaia Romania, vol. 1, 2001, pp. 137-140, XP001153332.
Nathanson, H.C. et al.,The Resonant Gate Transistor, IEEE Transactions on Electron Devices IEEE Inc., New York, vol. ED-14, No. 3, Mar. 1967, pp. 117-133, XP001040818.
Chou, T.,K., et al.,Fabrication of Out-of-Plane Curved Surfaces in SI by Utilizong RIE Lag, MEMS 2002, Las Vegas, NV, Jan. 20-24, 2002, IEEE International Micro Electro Mechanical Systems Conference, vol. Conf. 15, 2002, pp. 145-148, XP010577616.

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