Coating apparatus – Gas or vapor deposition
Patent
1995-10-10
1997-06-24
Bueker, Richard
Coating apparatus
Gas or vapor deposition
118733, 118 50, C23C 1600
Patent
active
056413580
ABSTRACT:
A tank-like deposition chamber for use in depositing vapors on desired substrates. The deposition chamber has top and bottom ends, and includes a floor which defines the bottom end thereof. In addition to the floor, the deposition chamber includes a vertical sidewall having an inner surface and an upper edge, and at least one wall extension member which is releasably attached to the upper edge of the sidewall and has an upper rim which defines the top end of the deposition chamber. The wall extension member, sidewall and floor define an interior compartment. Attached to the sidewall and communicating with the interior compartment is a vapor inlet port and a first vapor outlet port. Additionally, attached to the wall extension member and communicating with the interior compartment is a second vapor outlet port. The wall extension member increases the storage capacity of the deposition chamber when attached to the upper edge of the sidewall.
REFERENCES:
patent: 3491720 (1970-01-01), Harris
patent: 5078091 (1992-01-01), Stewart
patent: 5368648 (1994-11-01), Sekizuka
patent: 5497727 (1996-03-01), Mayeda
patent: 5534068 (1996-07-01), Beach
Bueker Richard
Lund Jeffrie R.
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