Modular deposition system having batch processing and serial thi

Details Modular deposition system having batch processing and serial thi Modular deposition system having batch processing and serial thi

1996-08-06

2000-10-31

McDonald, Rodney

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419213, 2041922, 20429825, 427128, 427131, 427251, 4272555, 118719, 414221, 414217, 41422201, 41422207, 41422213, C23C 1456

Patent

active

061396958

ABSTRACT:
A flexible, modular thin film deposition machine comprises a number of batch process stations which define a batch process path. At least one of the batch process stations is a thin film deposition station including a serial deposition chamber and an inter-chamber disk transfer mechanism. The disks move in batches along the process path, being individually processed only at the deposition station. Within the serial sputtering chambers of at least one deposition station there is at most partial environmental separation, whereas between different deposition stations the separation is complete. The resulting simplification of the transport mechanism provides for a high throughput rate while simultaneously minimizing contamination of individual thin film layers.

REFERENCES:
patent: 4401539 (1983-08-01), Abe et al.
patent: 4500407 (1985-02-01), Boys et al.
patent: 4569746 (1986-02-01), Hutchinson
patent: 4701251 (1987-10-01), Beardow
patent: 4756815 (1988-07-01), Turner et al.
patent: 4786564 (1988-11-01), Chen et al.
patent: 4810346 (1989-03-01), Wolf et al.
patent: 4869802 (1989-09-01), Wirz et al.
patent: 4911810 (1990-03-01), Lauro et al.
patent: 4971674 (1990-11-01), Hata
patent: 5033406 (1991-07-01), Lee
patent: 5106479 (1992-04-01), Takei et al.
patent: 5126027 (1992-06-01), Kudo et al.
patent: 5174875 (1992-12-01), Hurwitt et al.
patent: 5180478 (1993-01-01), Hughes
patent: 5215420 (1993-06-01), Hughes et al.
patent: 5228968 (1993-07-01), Zejda
patent: 5244554 (1993-09-01), Yamagata et al.
patent: 5262030 (1993-11-01), Potter
patent: 5316864 (1994-05-01), Hedgcoth
patent: 5421979 (1995-06-01), Stevenson
patent: 5512150 (1996-04-01), Bourez et al.
Abe et al. "Planar Magnetron Sputtering Cathode With Deposition Rate Distribution Controllability," Thin Solid Films, 96:225-233 (1992).

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