Mirror unit and an exposure apparatus using the unit

X-ray or gamma ray systems or devices – Specific application – Lithography

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Details

378 82, 378145, G21K 500

Patent

active

055725635

ABSTRACT:
A mirror unit includes a mirror having a reflecting surface, a holding member for supporting the mirror and an airtight chamber incorporating the mirror, supported by the holding member, in an airtight state. Either the mirror or the holding member constitutes a portion of a side wall of the airtight chamber. The mirror unit can be suitably used in an exposure apparatus which uses a synchrotron radiation light source or the like as a light source.

REFERENCES:
patent: 2617942 (1952-11-01), McLachlan
patent: 5390228 (1995-02-01), Niibe et al.

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