Mirror for providing selective exposure in X-ray lithography

Details Mirror for providing selective exposure in X-ray lithography Mirror for providing selective exposure in X-ray lithography

1997-08-08

1999-12-28

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 85, G21K 500

Patent

active

060091436

ABSTRACT:
An inventive mirror system for use in providing reflected X-ray radiation to a mask having pattern areas and opaque areas, comprising a plurality of parallel mirror segments which are vertically positioned with respect to each other at distances approximately equal to the widths of the corresponding opaque mask areas. In operation, radiation incident on each of the mirror segments is reflected to the patterned feature areas of the mask and skips over the opaque mask areas.

REFERENCES:
patent: 4587184 (1986-05-01), Schnieder-Gmelch et al.
patent: 5111491 (1992-05-01), Imai et al.
patent: 5115456 (1992-05-01), Kimura et al.
patent: 5227268 (1993-07-01), Koga et al.
patent: 5235626 (1993-08-01), Flamholz et al.
patent: 5439781 (1995-08-01), MacDowell et al.
patent: 5459001 (1995-10-01), Estes et al.
patent: 5572562 (1996-11-01), Rostoker et al.
patent: 5593800 (1997-01-01), Fujioka et al.
"X-Ray Exposure Mask", Patent Abstracts of Japan vol. 8, No. 81 (Apr. 1984) .

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