Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-09-29
1996-01-09
Chapman, Mark
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
43027014, 4302721, 430323, 522 6, 522904, G03C 500
Patent
active
054828171
ABSTRACT:
An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
REFERENCES:
patent: 3642480 (1972-02-01), Vrancker
patent: 4008083 (1977-02-01), Pye
patent: 4137365 (1979-01-01), Wydeven et al.
patent: 4362809 (1982-12-01), Chen et al.
patent: 4370405 (1983-01-01), O'Toole et al.
patent: 4405707 (1983-09-01), Bierhenke et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4515886 (1985-05-01), Yamaoka et al.
patent: 4529685 (1985-07-01), Borodovsky
patent: 4587203 (1986-05-01), Brault et al.
patent: 4592993 (1986-06-01), Ohnishi
patent: 4609614 (1986-09-01), Pampalone et al.
patent: 4623609 (1986-11-01), Harita et al.
patent: 4644025 (1987-02-01), Sakaeami
patent: 4746596 (1988-05-01), Yoshioka et al.
patent: 4758305 (1988-07-01), Bonifield et al.
patent: 4759990 (1988-07-01), Yen
patent: 4761464 (1988-08-01), Zeigler
patent: 4782009 (1988-11-01), Bolon et al.
patent: 4822718 (1989-04-01), Latham et al.
patent: 4855199 (1989-08-01), Bolon et al.
patent: 4871646 (1989-10-01), Hayase et al.
patent: 4910122 (1990-03-01), Arnold et al.
patent: 5057399 (1991-10-01), Flaim et al.
patent: 5110697 (1992-05-01), Lamb et al.
patent: 5126289 (1992-06-01), Ziger
patent: 5234990 (1993-08-01), Flaim et al.
patent: 5271803 (1993-12-01), Yen
patent: 5380621 (1995-01-01), Dichiara et al.
patent: 5401614 (1995-03-01), Dichiara et al.
Lessor, et al. IBM Tech. Discl. Bulletin, vol. 20, No. 11B, Apr. 1978.
O'Toole, et al. IEEE, "Linewwidth Control in Projection Lithography Using a Multilayer Resist Process", vol. Ed-28, No. 11, Nov. 1981.
Brewer, et al., J. Apl. Photogr. Eng., "The Reduction of the Standing Wave Effect in Positive Photoresists" 184-186, vol. 7, No. 6, 1981.
Lin, et al., J. Appl. Phys. "Improvement of Linewidth Control With Anti-Reflective Coating in Optical Lithography" 1110-1115, 1984.
R. West, J. Organomet. Chem. "The Polysilane high Polymers" 300, 327 (1986).
Horn, Solid State Technology, "Antireflection Layers and Planarization for Microlithography", 57-62, 1991.
L. Schlegel, et al., J. Vac. Sci. Technol., "Determination of Acid Diffusion in Chemical Amplification Positive Deep ultraviolet Resists", B9, 278 (1991).
Dudley, et al., Proc. Spie, "Enhancement of Deep UV Patterning integrity and Process Control Using Antireflective Coating", 1672, 638 (1992).
Zhang, et al., "Organosilane Polymers:--Diphenylsilyene--" Journal of Polymer Science, Polymer Letters, Ed. vol. 23, No. 9, Sep. 1985, pp. 479-485.
Dichiara Robert R.
Lyons Christopher F.
Sooriyakumaran Ratnasabapathy
Spinillo Gary T.
Welsh Kevin M.
Chapman Mark
Crockatt Dale M.
International Business Machines - Corporation
LandOfFree
Mid and deep-uv antireflection coatings and methods for use ther does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mid and deep-uv antireflection coatings and methods for use ther, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mid and deep-uv antireflection coatings and methods for use ther will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1302117