Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1993-05-03
1995-01-10
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430270, 522 6, 522904, G03C 1492
Patent
active
053806212
ABSTRACT:
An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
REFERENCES:
patent: 4137365 (1979-01-01), Wydeven et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4515886 (1985-07-01), Yamaoka et al.
patent: 4529685 (1985-07-01), Borodovsky et al.
patent: 4587203 (1986-05-01), Brault et al.
patent: 4623609 (1986-11-01), Harita et al.
patent: 4746596 (1988-05-01), Yoshioka et al.
patent: 4758305 (1988-07-01), Bonifield et al.
patent: 4761464 (1988-08-01), Zeigler et al.
patent: 4782009 (1988-11-01), Bolon et al.
patent: 4855199 (1989-08-01), Bolon et al.
patent: 4871646 (1989-10-01), Hayase et al.
patent: 4910122 (1990-03-01), Arnold et al.
Zhang et al "Organosilane Polymers:--Diphenylsilylene--". Journal of Polymer Science, Polymer Letters Ed. vol. 23, No. 9. Sep. 1985. pp. 479-485.
R. West, "The Polysilane High Polymers", J. Organometallic Chem., 300, 327 (1986).
Dichiara Robert R.
Lyons Christopher F.
Sooriyakumaran Ratnasabapathy
Spinillo Gary T.
Welsh Kevin M.
Chapman Mark A.
Crockatt Dale M.
International Business Machines - Corporation
McCamish Marion E.
Stemwedel John A.
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